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A critical assumption underlying in situ transmission electron microscopy studies is that the electron beam (e-beam) exposure does not fundamentally alter the intrinsic deformation behavior of the materials being probed.

A critical assumption underlying in situ transmission electron microscopy studies is that the electron beam (e-beam) exposure does not fundamentally alter the intrinsic deformation behavior of the materials being probed. Here, we show that e-beam exposure causes increased dislocation activation and marked stress relaxation in aluminum and gold films spanning a range of thicknesses (80–400 nanometers) and grain sizes (50–220 nanometers). Furthermore, the e-beam induces anomalous sample necking, which unusually depends more on the e-beam diameter than intensity.

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    Date Created
    • 2015-11-10
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    • Digital object identifier: 10.1038/srep16345
    • Identifier Type
      International standard serial number
      Identifier Value
      2045-2322
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    Sarkar, R., Rentenberger, C., & Rajagopalan, J. (2015). Electron Beam Induced Artifacts During in situ TEM Deformation of Nanostructured Metals. Scientific Reports, 5(1). doi:10.1038/srep16345

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