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Tunable Near-Field Radiative Heat Transfer Exceeding Blackbody Limit with Vanadium Dioxide Thin Film
This paper investigates near-field thermal radiation as the primary source of heat transfer between two parallel surfaces. This radiation takes place extremely close to the heated surfaces in study so the experimental set-up to be used will be done at the nanometer scale. The primary theory being investigated is that near-field radiation generates greater heat flux that conventional radiation governed by Planck’s law with maximum for blackbodies. Working with a phase shift material such as VO2 enables a switch-like effect to occur where the total amount of heat flux fluctuates as VO2 transitions from a metal to an insulator. In this paper, the theoretical heat flux and near-field radiation effect are modeled for a set-up of VO2 and SiO2 layers separated by different vacuum gaps. In addition, a physical experimental set-up is validated for future near-field radiation experiments.
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In this thesis, aluminum metasurface structures are proposed based on colloidal lithography method. High Frequency Structure Simulator is used to numerically study optical properties and design the aluminum metasurfaces with selective absorption. Simulation results show that proposed aluminum metasurface structure on aluminum oxide thin film and aluminum substrate has a major reflectance dip, whose wavelength is tunable within the near-infrared and visible spectrum with metasurface size. As the metasurface is opaque due to aluminum film, it indicates strong wavelength-selective optical absorption, which is due to the magnetic resonance between the top metasurface and bottom Al film within the aluminum oxide layer.
The proposed sample is fabricated based on colloidal lithography method. Monolayer polystyrene particles of 500 nm are successfully prepared and transferred onto silicon substrate. Scanning electron microscope is used to check the surface topography. Aluminum thin film with 20-nm or 50-nm thickness is then deposited on the sample. After monolayer particles are removed, optical properties of samples are measured by micro-scale optical reflectance and transmittance microscope. Measured and simulated reflectance of these samples do not have frequency selective properties and is not sensitive to defects. The next step is to fabricate the Al metasurface on Al_2 O_3 and Al films to experimentally demonstrate the selective absorption predicted from the numerical simulation.
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