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- All Subjects: CBRAM
- Creators: Schroder, Dieter K.
- Creators: Alford, Dr. Terry
Description
Programmable metallization cell (PMC) technology is based on an electrochemical phenomenon in which a metallic electrodeposit can be grown or dissolved between two electrodes depending on the voltage applied between them. Devices based on this phenomenon exhibit a unique, self-healing property, as a broken metallic structure can be healed by applying an appropriate voltage between the two broken ends. This work explores methods of fabricating interconnects and switches based on PMC technology on flexible substrates. The objective was the evaluation of the feasibility of using this technology in flexible electronics applications in which reliability is a primary concern. The re-healable property of the interconnect is characterized for the silver doped germanium selenide (Ag-Ge-Se) solid electrolyte system. This property was evaluated by measuring the resistances of the healed interconnect structures and comparing these to the resistances of the unbroken structures. The reliability of the interconnects in both unbroken and healed states is studied by investigating the resistances of the structures to DC voltages, AC voltages and different temperatures as a function of time. This work also explores replacing silver with copper for these interconnects to enhance their reliability. A model for PMC-based switches on flexible substrates is proposed and compared to the observed device behavior with the objective of developing a formal design methodology for these devices. The switches were subjected to voltage sweeps and their resistance was investigated as a function of sweep voltage. The resistance of the switches as a function of voltage pulse magnitude when placed in series with a resistance was also investigated. A model was then developed to explain the behavior of these devices. All observations were based on statistical measurements to account for random errors. The results of this work demonstrate that solid electrolyte based interconnects display self-healing capability, which depends on the applied healing voltage and the current limit. However, they fail at lower current densities than metal interconnects due to an ion-drift induced failure mechanism. The results on the PMC based switches demonstrate that a model comprising a Schottky diode in parallel with a variable resistor predicts the behavior of the device.
ContributorsBaliga, Sunil Ravindranath (Author) / Kozicki, Michael N (Thesis advisor) / Schroder, Dieter K. (Committee member) / Chae, Junseok (Committee member) / Alford, Terry L. (Committee member) / Arizona State University (Publisher)
Created2011
Description
Programmable Metallization Cell (PMC) technology has been shown to possess the necessary qualities for it to be considered as a leading contender for the next generation memory. These qualities include high speed and endurance, extreme scalability, ease of fabrication, ultra low power operation, and perhaps most importantly ease of integration with the CMOS back end of line (BEOL) process flow. One area where detailed study is lacking is the reliability of PMC devices. In previous reliability work, the low and high resistance states were monitored for periods of hours to days without any applied voltage and the results were extrapolated to several years (>10) but little has been done to analyze the low resistance state under stress. With or without stress, the low resistance state appears to be highly stable but a gradual increase in resistance with time, less than one order of magnitude after ten years when extrapolated, has been observed. It is important to understand the physics behind this resistance rise mechanism to comprehend the reliability issues associated with the low resistance state. This is also related to the erase process in PMC cells where the transition from the ON to OFF state occurs under a negative voltage. Hence it is important to investigate this erase process in PMC cells under different conditions and to model it. Analyzing the programming and the erase operations separately is important for any memory technology but its ability to cycle efficiently (reliably) at low voltages and for more than 1E4 cycles (without affecting the cells performance) is more critical. Future memory technologies must operate with the low power supply voltages (<1V) required for small geometry nodes. Low voltage programming of PMC memory devices has previously been demonstrated using slow voltage sweeps and small numbers of fast pulses. In this work PMC memory cells were cycled at low voltages using symmetric pulses with different load resistances and the distribution of the ON and OFF resistances was analyzed. The effect of the program current used during the program-erase cycling on the resulting resistance distributions is also investigated. Finally the variation found in the behavior of similar resistance ON states in PMC cells was analyzed more in detail and measures to reduce this variation were looked into. It was found that slow low current programming helped reducing the variation in erase times of similar resistance ON states in PMC cells. This scheme was also used as a pre-conditioning technique and the improvements in subsequent cycling behavior were compared.
ContributorsKamalanathan, Deepak (Author) / Kozicki, Dr. Michael (Thesis advisor) / Schroder, Dr. Dieter (Committee member) / Goryll, Dr. Michael (Committee member) / Alford, Dr. Terry (Committee member) / Arizona State University (Publisher)
Created2011
Description
Programmable Metallization Cell (PMC) is a resistance-switching device based on migration of nanoscale quantities of cations in a solid electrolyte and formation of a conducting electrodeposit by the reductions of these cations. This dissertation presents electrical characterization results on Cu-SiO2 based PMC devices, which due to the na- ture of materials can be easily integrated into the current Complimentary metal oxide semiconductor (CMOS) process line. Device structures representing individual mem- ory cells based on W bottom electrode and n-type Si bottom electrode were fabricated for characterization. For the W bottom electrode based devices, switching was ob- served for voltages in the range of 500mV and current value as low as 100 nA showing the electrochemical nature and low power potential. The ON state showed a direct de- pendence on the programming current, showing the possibility of multi-bit storage in a single cell. Room temperature retention was demonstrated in excess of 105 seconds and endurance to approximately 107 cycles. Switching was observed for microsecond duration 3 V amplitude pulses. Material characterization results from Raman, X-ray diffraction, Rutherford backscattering and Secondary-ion mass spectroscopy analysis shows the influence of processing conditions on the Cu concentration within the film and also the presence of Cu as free atoms. The results seemed to indicate stress-induced void formation in the SiO2 matrix as the driving mechanism for Cu diffusion into the SiO2 film. Cu/SiO2
Si based PMC devices were characterized and were shown to have inherent isolation characteristics, proving the feasibility of such a structure for a passive array. The inherent isolation property simplifies fabrication by avoiding the need for a separate diode element in an array. The isolation characteristics were studied mainly in terms of the leakage current. The nature of the diode interface was further studied by extracting a barrier potential which shows it can be approximated to a Cu-nSi metal semiconductor Schottky diode.
Si based PMC devices were characterized and were shown to have inherent isolation characteristics, proving the feasibility of such a structure for a passive array. The inherent isolation property simplifies fabrication by avoiding the need for a separate diode element in an array. The isolation characteristics were studied mainly in terms of the leakage current. The nature of the diode interface was further studied by extracting a barrier potential which shows it can be approximated to a Cu-nSi metal semiconductor Schottky diode.
ContributorsPuthenthermadam, Sarath (Author) / Kozicki, Michael N (Thesis advisor) / Diaz, Rodolfo (Committee member) / Schroder, Dieter K. (Committee member) / Alford, Terry (Committee member) / Arizona State University (Publisher)
Created2011