Matching Items (4)
Filtering by

Clear all filters

152848-Thumbnail Image.png
Description
Single molecule identification is one essential application area of nanotechnology. The application areas including DNA sequencing, peptide sequencing, early disease detection and other industrial applications such as quantitative and quantitative analysis of impurities, etc. The recognition tunneling technique we have developed shows that after functionalization of the probe and substrate

Single molecule identification is one essential application area of nanotechnology. The application areas including DNA sequencing, peptide sequencing, early disease detection and other industrial applications such as quantitative and quantitative analysis of impurities, etc. The recognition tunneling technique we have developed shows that after functionalization of the probe and substrate of a conventional Scanning Tunneling Microscope with recognition molecules ("tethered molecule-pair" configuration), analyte molecules trapped in the gap that is formed by probe and substrate will bond with the reagent molecules. The stochastic bond formation/breakage fluctuations give insight into the nature of the intermolecular bonding at a single molecule-pair level. The distinct time domain and frequency domain features of tunneling signals were extracted from raw signals of analytes such as amino acids and their enantiomers. The Support Vector Machine (a machine-learning method) was used to do classification and predication based on the signal features generated by analytes, giving over 90% accuracy of separation of up to seven analytes. This opens up a new interface between chemistry and electronics with immediate implications for rapid Peptide/DNA sequencing and molecule identification at single molecule level.
ContributorsZhao, Yanan, 1986- (Author) / Lindsay, Stuart (Thesis advisor) / Nemanich, Robert (Committee member) / Qing, Quan (Committee member) / Ros, Robert (Committee member) / Zhang, Peiming (Committee member) / Arizona State University (Publisher)
Created2014
Description

In this project, we aim to fabricate PIN structure-like diodes for radiation detectors using Boron Nitride (BN). This fabrication is done by performing lithography and metal deposition processes on a Cubic Boron Nitride (cBN) of around 200 nm in thickness layer on top of a boron doped diamond substrate. The

In this project, we aim to fabricate PIN structure-like diodes for radiation detectors using Boron Nitride (BN). This fabrication is done by performing lithography and metal deposition processes on a Cubic Boron Nitride (cBN) of around 200 nm in thickness layer on top of a boron doped diamond substrate. The main goal is to create the most efficient and affordable alpha particle—and ideally neutron—detector in a radiation setting. Thus, making more accessible radiation detectors that can be more easily produced and disposed of, as well as minimizing the size of conventional detectors.

ContributorsGutierrez, Eric (Author) / Nemanich, Robert (Thesis director) / Zaniewski, Anna (Committee member) / Barrett, The Honors College (Contributor) / Department of Physics (Contributor)
Created2023-05
131279-Thumbnail Image.png
Description
In this project we are analyzing the diamond-titanium interface as it applies to diamond-based diode devices, including alpha particle, proton, and neutron detectors. This is done through the fabrication of an O-terminated B-doped diamond sample with a 20 Å Ti / 10 Å Pt overlayer which was then annealed and

In this project we are analyzing the diamond-titanium interface as it applies to diamond-based diode devices, including alpha particle, proton, and neutron detectors. This is done through the fabrication of an O-terminated B-doped diamond sample with a 20 Å Ti / 10 Å Pt overlayer which was then annealed and examined via X-ray photoelectron spectroscopy (XPS). It was discovered that after annealing the sample at temperatures ranging from 400 C - 900 C that TiC was not formed at any point during this experiment. Possible reasons for this include a lack of sufficient titanium in order to form TiC and over oxygenating the diamond surface before the metal was deposited.
ContributorsJohnson, Holly (Author) / Zaniewski, Anna (Thesis director) / Nemanich, Robert (Committee member) / Department of Physics (Contributor) / Barrett, The Honors College (Contributor)
Created2020-05
164946-Thumbnail Image.png
Description
This paper begins with an introduction to the topics relevant to the research presented. Properties of diamond, diamond’s ability to be used in power electronics compared to other semiconducting materials, and a brief overview of field effect transistors are among the topics discussed. The remainder of the paper centers around

This paper begins with an introduction to the topics relevant to the research presented. Properties of diamond, diamond’s ability to be used in power electronics compared to other semiconducting materials, and a brief overview of field effect transistors are among the topics discussed. The remainder of the paper centers around research that has been conducted on seven diamond samples. Interface characterization was performed on two diamond samples, one with a high boron incorporation epitaxial layer and another with a low boron incorporation epitaxial layer. UPS He I analysis and UPS He II analysis were used to construct band alignments for the two samples, which revealed no significant differences between their measured properties. A Python program designed to optimize XPS loss peak and UPS He II graphical data analysis is also discussed in detail. Next, Hall effect measurements are examined. Hall effect measurements were carried out on seven diamond samples, two of which have high boron incorporation epitaxial layers, two of which have low boron incorporation epitaxial layers, one of which has a moderate boron incorporation epitaxial layer, and two of which have a phosphorus-doped epitaxial layer. Hall measurements of the boron-doped samples revealed no significant differences in measured parameters amongst the samples with varying boron incorporation epitaxial layers, with the exception of an expected difference in measured carrier concentration proportional to the amount of dopant incorporation in the layers. Some samples with boron-doped epitaxial layers produced measurements indicating n-type charge carriers, which is unexpected given the p-type charge carriers within these samples. The phosphorus-doped samples were unable to be measured due to overly high resistance following an oxygen termination step, and this effect was functionally reversed following hydrogen termination of the samples. It is hypothesized that Fermi pinning is responsible for this effect. The paper concludes with a summary of data discussed in previous sections and a suggested direction for future research on this topic.
ContributorsJacobs, Madeleine (Author) / Nemanich, Robert (Thesis director) / Botana, Antia (Committee member) / Barrett, The Honors College (Contributor) / College of Integrative Sciences and Arts (Contributor)
Created2022-05