Matching Items (5)
Description
Register file (RF) memory is important in low power system on chip (SOC) due to its
inherent low voltage stability. Moreover, designs increasingly use compiled instead of custom memory blocks, which frequently employ static, rather than pre-charged dynamic RFs. In this work, the various RFs designed for a microprocessor cache and register files are discussed. Comparison between static and dynamic RF power dissipation and timing characteristics is also presented. The relative timing and power advantages of the designs are shown to be dependent on the memory aspect ratio, i.e. array width and height.
inherent low voltage stability. Moreover, designs increasingly use compiled instead of custom memory blocks, which frequently employ static, rather than pre-charged dynamic RFs. In this work, the various RFs designed for a microprocessor cache and register files are discussed. Comparison between static and dynamic RF power dissipation and timing characteristics is also presented. The relative timing and power advantages of the designs are shown to be dependent on the memory aspect ratio, i.e. array width and height.
ContributorsVashishtha, Vinay (Author) / Clark, Lawrence T. (Thesis advisor) / Seo, Jae-Sun (Committee member) / Ogras, Umit Y. (Committee member) / Arizona State University (Publisher)
Created2014
Description
The space environment comprises cosmic ray particles, heavy ions and high energy electrons and protons. Microelectronic circuits used in space applications such as satellites and space stations are prone to upsets induced by these particles. With transistor dimensions shrinking due to continued scaling, terrestrial integrated circuits are also increasingly susceptible to radiation upsets. Hence radiation hardening is a requirement for microelectronic circuits used in both space and terrestrial applications.
This work begins by exploring the different radiation hardened flip-flops that have been proposed in the literature and classifies them based on the different hardening techniques.
A reduced power delay element for the temporal hardening of sequential digital circuits is presented. The delay element single event transient tolerance is demonstrated by simulations using it in a radiation hardened by design master slave flip-flop (FF). Using the proposed delay element saves up to 25% total FF power at 50% activity factor. The delay element is used in the implementation of an 8-bit, 8051 designed in the TSMC 130 nm bulk CMOS.
A single impinging ionizing radiation particle is increasingly likely to upset multiple circuit nodes and produce logic transients that contribute to the soft error rate in most modern scaled process technologies. The design of flip-flops is made more difficult with increasing multi-node charge collection, which requires that charge storage and other sensitive nodes be separated so that one impinging radiation particle does not affect redundant nodes simultaneously. We describe a correct-by-construction design methodology to determine a-priori which hardened FF nodes must be separated, as well as a general interleaving scheme to achieve this separation. We apply the methodology to radiation hardened flip-flops and demonstrate optimal circuit physical organization for protection against multi-node charge collection.
Finally, the methodology is utilized to provide critical node separation for a new hardened flip-flop design that reduces the power and area by 31% and 35% respectively compared to a temporal FF with similar hardness. The hardness is verified and compared to other published designs via the proposed systematic simulation approach that comprehends multiple node charge collection and tests resiliency to upsets at all internal and input nodes. Comparison of the hardness, as measured by estimated upset cross-section, is made to other published designs. Additionally, the importance of specific circuit design aspects to achieving hardness is shown.
This work begins by exploring the different radiation hardened flip-flops that have been proposed in the literature and classifies them based on the different hardening techniques.
A reduced power delay element for the temporal hardening of sequential digital circuits is presented. The delay element single event transient tolerance is demonstrated by simulations using it in a radiation hardened by design master slave flip-flop (FF). Using the proposed delay element saves up to 25% total FF power at 50% activity factor. The delay element is used in the implementation of an 8-bit, 8051 designed in the TSMC 130 nm bulk CMOS.
A single impinging ionizing radiation particle is increasingly likely to upset multiple circuit nodes and produce logic transients that contribute to the soft error rate in most modern scaled process technologies. The design of flip-flops is made more difficult with increasing multi-node charge collection, which requires that charge storage and other sensitive nodes be separated so that one impinging radiation particle does not affect redundant nodes simultaneously. We describe a correct-by-construction design methodology to determine a-priori which hardened FF nodes must be separated, as well as a general interleaving scheme to achieve this separation. We apply the methodology to radiation hardened flip-flops and demonstrate optimal circuit physical organization for protection against multi-node charge collection.
Finally, the methodology is utilized to provide critical node separation for a new hardened flip-flop design that reduces the power and area by 31% and 35% respectively compared to a temporal FF with similar hardness. The hardness is verified and compared to other published designs via the proposed systematic simulation approach that comprehends multiple node charge collection and tests resiliency to upsets at all internal and input nodes. Comparison of the hardness, as measured by estimated upset cross-section, is made to other published designs. Additionally, the importance of specific circuit design aspects to achieving hardness is shown.
ContributorsShambhulingaiah, Sandeep (Author) / Clark, Lawrence (Thesis advisor) / Holbert, Keith E. (Committee member) / Seo, Jae sun (Committee member) / Allee, David (Committee member) / Arizona State University (Publisher)
Created2015
Description
Over decades, scientists have been scaling devices to increasingly smaller feature sizes for ever better performance of complementary metal-oxide semiconductor (CMOS) technology to meet requirements on speed, complexity, circuit density, power consumption and ultimately cost required by many advanced applications. However, going to these ultra-scaled CMOS devices also brings some drawbacks. Aging due to bias-temperature-instability (BTI) and Hot carrier injection (HCI) is the dominant cause of functional failure in large scale logic circuits. The aging phenomena, on top of process variations, translate into complexity and reduced design margin for circuits. Such issues call for “Design for Reliability”. In order to increase the overall design efficiency, it is important to (i) study the impact of aging on circuit level along with the transistor level understanding (ii) calibrate the theoretical findings with measurement data (iii) implementing tools that analyze the impact of BTI and HCI reliability on circuit timing into VLSI design process at each stage. In this work, post silicon measurements of a 28nm HK-MG technology are done to study the effect of aging on Frequency Degradation of digital circuits. A novel voltage controlled ring oscillator (VCO) structure, developed by NIMO research group is used to determine the effect of aging mechanisms like NBTI, PBTI and SILC on circuit parameters. Accelerated aging mechanism is proposed to avoid the time consuming measurement process and extrapolation of data to the end of life thus instead of predicting the circuit behavior, one can measure it, within a short period of time. Finally, to bridge the gap between device level models and circuit level aging analysis, a System Level Reliability Analysis Flow (SyRA) developed by NIMO group, is implemented for a TSMC 65nm industrial level design to achieve one-step reliability prediction for digital design.
ContributorsBansal, Ankita (Author) / Cao, Yu (Thesis advisor) / Seo, Jae sun (Committee member) / Barnaby, Hugh (Committee member) / Arizona State University (Publisher)
Created2016
Description
Flash memories are critical for embedded devices to operate properly but are susceptible to radiation effects, which make flash memory a key factor to improve the reliability of circuitry. This thesis describes the simulation techniques used to analyze and predict total ionizing dose (TID) effects on 90-nm technology Silicon Storage Technology (SST) SuperFlash Generation 3 devices. Silvaco Atlas is used for both device level design and simulation purposes.
The simulations consist of no radiation and radiation modeling. The no radiation modeling details the cell structure development and characterizes basic operations (read, erase and program) of a flash memory cell. The program time is observed to be approximately 10 μs while the erase time is approximately 0.1 ms.
The radiation modeling uses the fixed oxide charge method to analyze the TID effects on the same flash memory cell. After irradiation, a threshold voltage shift of the flash memory cell is observed. The threshold voltages of a programmed cell and an erased cell are reduced at an average rate of 0.025 V/krad.
The use of simulation techniques allows designers to better understand the TID response of a SST flash memory cell and to predict cell level TID effects without performing the costly in-situ irradiation experiments. The simulation and experimental results agree qualitatively. In particular, simulation results reveal that ‘0’ to ‘1’ errors but not ‘1’ to ‘0’ retention errors occur; likewise, ‘0’ to ‘1’ errors dominate experimental testing, which also includes circuitry effects that can cause ‘1’ to ‘0’ failures. Both simulation and experimental results reveal flash memory cell TID resilience to about 200 krad.
The simulations consist of no radiation and radiation modeling. The no radiation modeling details the cell structure development and characterizes basic operations (read, erase and program) of a flash memory cell. The program time is observed to be approximately 10 μs while the erase time is approximately 0.1 ms.
The radiation modeling uses the fixed oxide charge method to analyze the TID effects on the same flash memory cell. After irradiation, a threshold voltage shift of the flash memory cell is observed. The threshold voltages of a programmed cell and an erased cell are reduced at an average rate of 0.025 V/krad.
The use of simulation techniques allows designers to better understand the TID response of a SST flash memory cell and to predict cell level TID effects without performing the costly in-situ irradiation experiments. The simulation and experimental results agree qualitatively. In particular, simulation results reveal that ‘0’ to ‘1’ errors but not ‘1’ to ‘0’ retention errors occur; likewise, ‘0’ to ‘1’ errors dominate experimental testing, which also includes circuitry effects that can cause ‘1’ to ‘0’ failures. Both simulation and experimental results reveal flash memory cell TID resilience to about 200 krad.
ContributorsChen, Yitao (Author) / Holbert, Keith E. (Thesis advisor) / Clark, Lawrence T. (Committee member) / Allee, David R. (Committee member) / Arizona State University (Publisher)
Created2016
Description
Recent years have seen fin field effect transistors (finFETs) dominate modern complementary metal oxide semiconductor (CMOS) processes, [1][2], e.g., at the sub 20 nm technology nodes, as they alleviate short channel effects, provide lower leakage, and enable some continued VDD scaling. However, a realistic finFET based predictive process design kit (PDK) that supports investigation into both circuit and physical design, encompassing all aspects of digital design, for academic use has been unavailable. While the finFET based FreePDK15 was supplemented with a standard cell library, it lacked full physical verification (LVS) and parasitic extraction at the time [3][4]. Consequently, the only available sub 45 nm educational PDKs are the planar CMOS based Synopsys 32/28 nm and FreePDK45 (45 nm PDK) [5][6]. The cell libraries available for those processes are not realistic since they use large cell heights, in contrast to recent industry trends. Additionally, the SRAM rules and cells provided by these PDKs are not realistic. Because finFETs have a 3D structure, which affects transistor density, using planar libraries scaled to sub 22 nm dimensions for research is likely to give poor accuracy.
Commercial libraries and PDKs, especially for advanced nodes, are often difficult to obtain for academic use, and access to the actual physical layouts is even more restricted. Furthermore, the necessary non disclosure agreements (NDAs) are un manageable for large university classes and the plethora of design rules can distract from the key points. NDAs also make it difficult for the publication of physical design as these may disclose proprietary design rules and structures.
This work focuses on the development of realistic PDKs for academic use that overcome these limitations. These PDKs, developed for the N7 and N5 nodes, even before 7 nm and 5 nm processes were available in industry, are thus predictive. The predictions have been based on publications of the continually improving lithography, as well as estimates of what would be available at N7 and N5. For the most part, these assumptions have been accurate with regards to N7, except for the expectation that extreme ultraviolet (EUV) lithography would be widely available, which has turned out to be optimistic.
Commercial libraries and PDKs, especially for advanced nodes, are often difficult to obtain for academic use, and access to the actual physical layouts is even more restricted. Furthermore, the necessary non disclosure agreements (NDAs) are un manageable for large university classes and the plethora of design rules can distract from the key points. NDAs also make it difficult for the publication of physical design as these may disclose proprietary design rules and structures.
This work focuses on the development of realistic PDKs for academic use that overcome these limitations. These PDKs, developed for the N7 and N5 nodes, even before 7 nm and 5 nm processes were available in industry, are thus predictive. The predictions have been based on publications of the continually improving lithography, as well as estimates of what would be available at N7 and N5. For the most part, these assumptions have been accurate with regards to N7, except for the expectation that extreme ultraviolet (EUV) lithography would be widely available, which has turned out to be optimistic.
ContributorsVashishtha, Vinay (Author) / Clark, Lawrence T. (Thesis advisor) / Allee, David R. (Committee member) / Ogras, Umit Y. (Committee member) / Seo, Jae sun (Committee member) / Arizona State University (Publisher)
Created2019