Matching Items (2)
Description
A relatively simple subset of nanotechnology - nanofluids - can be obtained by adding nanoparticles to conventional base fluids. The promise of these fluids stems from the fact that relatively low particle loadings (typically <1% volume fractions) can significantly change the properties of the base fluid. This research explores how low volume fraction nanofluids, composed of common base-fluids, interact with light energy. Comparative experimentation and modeling reveals that absorbing light volumetrically (i.e. in the depth of the fluid) is fundamentally different from surface-based absorption. Depending on the particle material, size, shape, and volume fraction, a fluid can be changed from being mostly transparent to sunlight (in the case of water, alcohols, oils, and glycols) to being a very efficient volumetric absorber of sunlight. This research also visualizes, under high levels of irradiation, how nanofluids undergo interesting, localized phase change phenomena. For this, images were taken of bubble formation and boiling in aqueous nanofluids heated by a hot wire and by a laser. Infrared thermography was also used to quantify this phenomenon. Overall, though, this research reveals the possibility for novel solar collectors in which the working fluid directly absorbs light energy and undergoes phase change in a single step. Modeling results indicate that these improvements can increase a solar thermal receiver's efficiency by up to 10%.
ContributorsTaylor, Robert (Author) / Phelan, Patrick E (Thesis advisor) / Adrian, Ronald (Committee member) / Trimble, Steve (Committee member) / Posner, Jonathan (Committee member) / Maracas, George (Committee member) / Arizona State University (Publisher)
Created2011
Description
Mostly, manufacturing tolerance charts are used these days for manufacturing tolerance transfer but these have the limitation of being one dimensional only. Some research has been undertaken for the three dimensional geometric tolerances but it is too theoretical and yet to be ready for operator level usage. In this research, a new three dimensional model for tolerance transfer in manufacturing process planning is presented that is user friendly in the sense that it is built upon the Coordinate Measuring Machine (CMM) readings that are readily available in any decent manufacturing facility. This model can take care of datum reference change between non orthogonal datums (squeezed datums), non-linearly oriented datums (twisted datums) etc. Graph theoretic approach based upon ACIS, C++ and MFC is laid out to facilitate its implementation for automation of the model. A totally new approach to determining dimensions and tolerances for the manufacturing process plan is also presented. Secondly, a new statistical model for the statistical tolerance analysis based upon joint probability distribution of the trivariate normal distributed variables is presented. 4-D probability Maps have been developed in which the probability value of a point in space is represented by the size of the marker and the associated color. Points inside the part map represent the pass percentage for parts manufactured. The effect of refinement with form and orientation tolerance is highlighted by calculating the change in pass percentage with the pass percentage for size tolerance only. Delaunay triangulation and ray tracing algorithms have been used to automate the process of identifying the points inside and outside the part map. Proof of concept software has been implemented to demonstrate this model and to determine pass percentages for various cases. The model is further extended to assemblies by employing convolution algorithms on two trivariate statistical distributions to arrive at the statistical distribution of the assembly. Map generated by using Minkowski Sum techniques on the individual part maps is superimposed on the probability point cloud resulting from convolution. Delaunay triangulation and ray tracing algorithms are employed to determine the assembleability percentages for the assembly.
ContributorsKhan, M Nadeem Shafi (Author) / Phelan, Patrick E (Thesis advisor) / Montgomery, Douglas C. (Committee member) / Farin, Gerald (Committee member) / Roberts, Chell (Committee member) / Henderson, Mark (Committee member) / Arizona State University (Publisher)
Created2011