Matching Items (4)
Description
Memories play an integral role in today's advanced ICs. Technology scaling has enabled high density designs at the price paid for impact due to variability and reliability. It is imperative to have accurate methods to measure and extract the variability in the SRAM cell to produce accurate reliability projections for future technologies. This work presents a novel test measurement and extraction technique which is non-invasive to the actual operation of the SRAM memory array. The salient features of this work include i) A single ended SRAM test structure with no disturbance to SRAM operations ii) a convenient test procedure that only requires quasi-static control of external voltages iii) non-iterative method that extracts the VTH variation of each transistor from eight independent switch point measurements. With the present day technology scaling, in addition to the variability with the process, there is also the impact of other aging mechanisms which become dominant. The various aging mechanisms like Negative Bias Temperature Instability (NBTI), Channel Hot Carrier (CHC) and Time Dependent Dielectric Breakdown (TDDB) are critical in the present day nano-scale technology nodes. In this work, we focus on the impact of NBTI due to aging in the SRAM cell and have used Trapping/De-Trapping theory based log(t) model to explain the shift in threshold voltage VTH. The aging section focuses on the following i) Impact of Statistical aging in PMOS device due to NBTI dominates the temporal shift of SRAM cell ii) Besides static variations , shifting in VTH demands increased guard-banding margins in design stage iii) Aging statistics remain constant during the shift, presenting a secondary effect in aging prediction. iv) We have investigated to see if the aging mechanism can be used as a compensation technique to reduce mismatch due to process variations. Finally, the entire test setup has been tested in SPICE and also validated with silicon and the results are presented. The method also facilitates the study of design metrics such as static, read and write noise margins and also the data retention voltage and thus help designers to improve the cell stability of SRAM.
ContributorsRavi, Venkatesa (Author) / Cao, Yu (Thesis advisor) / Bakkaloglu, Bertan (Committee member) / Clark, Lawrence (Committee member) / Arizona State University (Publisher)
Created2013
Description
Digital systems are increasingly pervading in the everyday lives of humans. The security of these systems is a concern due to the sensitive data stored in them. The physically unclonable function (PUF) implemented on hardware provides a way to protect these systems. Static random-access memories (SRAMs) are designed and used as a strong PUF to generate random numbers unique to the manufactured integrated circuit (IC).
Digital systems are important to the technological improvements in space exploration. Space exploration requires radiation hardened microprocessors which minimize the functional disruptions in the presence of radiation. The design highly efficient radiation-hardened microprocessor for enabling spacecraft (HERMES) is a radiation-hardened microprocessor with performance comparable to the commercially available designs. These designs are manufactured using a foundry complementary metal-oxide semiconductor (CMOS) 55-nm triple-well process. This thesis presents the post silicon validation results of the HERMES and the PUF mode of SRAM across process corners.
Chapter 1 gives an overview of the blocks implemented on the test chip 25. It also talks about the pre-silicon functional verification methodology used for the test chip. Chapter 2 discusses about the post silicon testing setup of test chip 25 and the validation of the setup. Chapter 3 describes the architecture and the test bench of the HERMES along with its testing results. Chapter 4 discusses the test bench and the perl scripts used to test the SRAM along with its testing results. Chapter 5 gives a summary of the post-silicon validation results of the HERMES and the PUF mode of SRAM.
Digital systems are important to the technological improvements in space exploration. Space exploration requires radiation hardened microprocessors which minimize the functional disruptions in the presence of radiation. The design highly efficient radiation-hardened microprocessor for enabling spacecraft (HERMES) is a radiation-hardened microprocessor with performance comparable to the commercially available designs. These designs are manufactured using a foundry complementary metal-oxide semiconductor (CMOS) 55-nm triple-well process. This thesis presents the post silicon validation results of the HERMES and the PUF mode of SRAM across process corners.
Chapter 1 gives an overview of the blocks implemented on the test chip 25. It also talks about the pre-silicon functional verification methodology used for the test chip. Chapter 2 discusses about the post silicon testing setup of test chip 25 and the validation of the setup. Chapter 3 describes the architecture and the test bench of the HERMES along with its testing results. Chapter 4 discusses the test bench and the perl scripts used to test the SRAM along with its testing results. Chapter 5 gives a summary of the post-silicon validation results of the HERMES and the PUF mode of SRAM.
ContributorsMedapuram, Sai Bharadwaj (Author) / Clark, Lawrence T (Thesis advisor) / Allee, David R. (Committee member) / Brunhaver, John S (Committee member) / Arizona State University (Publisher)
Created2017
Description
Deep neural networks (DNNs), as a main-stream algorithm for various AI tasks, achieve higher accuracy at the cost of increased computational complexity and model size, posing great challenges to hardware platforms. This dissertation first tackles the design challenges of resistive random-access-memory (RRAM) based in-memory computing (IMC) architectures. A new metric, model stability from the loss landscape, is proposed to help shed light on accuracy under variations and model compression and guide a novel variation-aware training (VAT) solution. The proposed method effectively improves post-mapping accuracy of multiple datasets. Next, a hybrid RRAM/SRAM IMC DNN inference accelerator is developed, that integrates an RRAM-based IMC macro, a reconfigurable SRAM-based multiply-accumulate (MAC) macro, and a programmable shifter. The hybrid IMC accelerator fully recovers the inference accuracy post the mapping. Furthermore, this dissertation researches on architectural optimizations for high IMC utilization, low on-chip communication cost, and low energy-delay product (EDP), including on-chip interconnect design, PE array utilization, and tile-to-router mapping and scheduling. The optimal choice of on-chip interconnect results in up to 6x improvement in energy-delay-area product for RRAM IMC architectures. Furthermore, the PE and NoC optimizations show up to 62% improvement in PE utilization, 78% reduction in area, and 78% lower energy-area product for a wide range of modern DNNs. Finally, this dissertation proposes a novel chiplet-based IMC benchmarking simulator, SIAM, and a heterogeneous chiplet IMC architecture to address the limitations of a monolithic DNN accelerator. SIAM utilizes model-based and cycle-accurate simulation to provide a scalable and flexible architecture. SIAM is calibrated against a published silicon result, SIMBA, from Nvidia. The heterogeneous architecture utilizes a custom mapping with a bank of big and little chiplets, and a hybrid network-on-package (NoP) to optimize the utilization, interconnect bandwidth, and energy efficiency. The proposed big-little chiplet-based RRAM IMC architecture significantly improves energy efficiency at lower area, compared to conventional GPUs. In summary, this dissertation comprehensively investigates novel methods that encompass device, circuits, architecture, packaging, and algorithm to design scalable high-performance and energy-efficient IMC architectures.
ContributorsKrishnan, Gokul (Author) / Cao, Yu (Thesis advisor) / Seo, Jae-Sun (Committee member) / Chakrabarti, Chaitali (Committee member) / Ogras, Umit Y. (Committee member) / Arizona State University (Publisher)
Created2022
Description
Recent years have seen fin field effect transistors (finFETs) dominate modern complementary metal oxide semiconductor (CMOS) processes, [1][2], e.g., at the sub 20 nm technology nodes, as they alleviate short channel effects, provide lower leakage, and enable some continued VDD scaling. However, a realistic finFET based predictive process design kit (PDK) that supports investigation into both circuit and physical design, encompassing all aspects of digital design, for academic use has been unavailable. While the finFET based FreePDK15 was supplemented with a standard cell library, it lacked full physical verification (LVS) and parasitic extraction at the time [3][4]. Consequently, the only available sub 45 nm educational PDKs are the planar CMOS based Synopsys 32/28 nm and FreePDK45 (45 nm PDK) [5][6]. The cell libraries available for those processes are not realistic since they use large cell heights, in contrast to recent industry trends. Additionally, the SRAM rules and cells provided by these PDKs are not realistic. Because finFETs have a 3D structure, which affects transistor density, using planar libraries scaled to sub 22 nm dimensions for research is likely to give poor accuracy.
Commercial libraries and PDKs, especially for advanced nodes, are often difficult to obtain for academic use, and access to the actual physical layouts is even more restricted. Furthermore, the necessary non disclosure agreements (NDAs) are un manageable for large university classes and the plethora of design rules can distract from the key points. NDAs also make it difficult for the publication of physical design as these may disclose proprietary design rules and structures.
This work focuses on the development of realistic PDKs for academic use that overcome these limitations. These PDKs, developed for the N7 and N5 nodes, even before 7 nm and 5 nm processes were available in industry, are thus predictive. The predictions have been based on publications of the continually improving lithography, as well as estimates of what would be available at N7 and N5. For the most part, these assumptions have been accurate with regards to N7, except for the expectation that extreme ultraviolet (EUV) lithography would be widely available, which has turned out to be optimistic.
Commercial libraries and PDKs, especially for advanced nodes, are often difficult to obtain for academic use, and access to the actual physical layouts is even more restricted. Furthermore, the necessary non disclosure agreements (NDAs) are un manageable for large university classes and the plethora of design rules can distract from the key points. NDAs also make it difficult for the publication of physical design as these may disclose proprietary design rules and structures.
This work focuses on the development of realistic PDKs for academic use that overcome these limitations. These PDKs, developed for the N7 and N5 nodes, even before 7 nm and 5 nm processes were available in industry, are thus predictive. The predictions have been based on publications of the continually improving lithography, as well as estimates of what would be available at N7 and N5. For the most part, these assumptions have been accurate with regards to N7, except for the expectation that extreme ultraviolet (EUV) lithography would be widely available, which has turned out to be optimistic.
ContributorsVashishtha, Vinay (Author) / Clark, Lawrence T. (Thesis advisor) / Allee, David R. (Committee member) / Ogras, Umit Y. (Committee member) / Seo, Jae sun (Committee member) / Arizona State University (Publisher)
Created2019