Matching Items (2)
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Description
A new arrangement of the Concerto for Two Horns in E-flat Major, Hob. VIId/6, attributed by some to Franz Joseph Haydn, is presented here. The arrangement reduces the orchestral portion to ten wind instruments, specifically a double wind quintet, to facilitate performance of the work. A full score and a

A new arrangement of the Concerto for Two Horns in E-flat Major, Hob. VIId/6, attributed by some to Franz Joseph Haydn, is presented here. The arrangement reduces the orchestral portion to ten wind instruments, specifically a double wind quintet, to facilitate performance of the work. A full score and a complete set of parts are included. In support of this new arrangement, a discussion of the early treatment of horns in pairs and the subsequent development of the double horn concerto in the eighteenth century provides historical context for the Concerto for Two Horns in E-flat major. A summary of the controversy concerning the identity of the composer of this concerto is followed by a description of the content and structure of each of its three movements. Some comments on the procedures of the arrangement complete the background information.
ContributorsYeh, Guan-Lin (Author) / Ericson, John (Thesis advisor) / Holbrook, Amy (Committee member) / Micklich, Albie (Committee member) / Pilafian, J. Samuel (Committee member) / Arizona State University (Publisher)
Created2011
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Description
This thesis explores the possibility of fabricating superconducting tunnel junctions (STJ) using double angle evaporation using an E-beam system. The traditional method of making STJs use a shadow mask to deposit two films requires the breaking of the vacuum of the main chamber. This technique has given bad results and

This thesis explores the possibility of fabricating superconducting tunnel junctions (STJ) using double angle evaporation using an E-beam system. The traditional method of making STJs use a shadow mask to deposit two films requires the breaking of the vacuum of the main chamber. This technique has given bad results and proven to be a tedious process. To improve on this technique, the E-beam system was modified by adding a load lock and transfer line to perform the multi-angle deposition and in situ oxidation in the load lock without breaking the vacuum of the main chamber. Bilayer photolithography process was used to prepare a pattern for double angle deposition for the STJ. The overlap length could be easily controlled by varying the deposition angles. The low-temperature resistivity measurement and scanning electron microscope (SEM) characterization showed that the deposited films were good. However, I-V measurement for tunnel junction did not give expected results for the quality of the fabricated STJs. The main objective of modifying the E-beam system for multiple angle deposition was achieved. It can be used for any application that requires angular deposition. The motivation for the project was to set up a system that can fabricate a device that can be used as a phonon spectrometer for phononic crystals. Future work will include improving the quality of the STJ and fabricating an STJs on both sides of a silicon substrate using a 4-angle deposition.
ContributorsRana, Ashish (Author) / Wang, Robert Y (Thesis advisor) / Newman, Nathan (Committee member) / Wang, Liping (Committee member) / Arizona State University (Publisher)
Created2019