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Description
As crystalline silicon solar cells continue to get thinner, the recombination of carriers at the surfaces of the cell plays an ever-important role in controlling the cell efficiency. One tool to minimize surface recombination is field effect passivation from the charges present in the thin films applied on the cell

As crystalline silicon solar cells continue to get thinner, the recombination of carriers at the surfaces of the cell plays an ever-important role in controlling the cell efficiency. One tool to minimize surface recombination is field effect passivation from the charges present in the thin films applied on the cell surfaces. The focus of this work is to understand the properties of charges present in the SiNx films and then to develop a mechanism to manipulate the polarity of charges to either negative or positive based on the end-application. Specific silicon-nitrogen dangling bonds (·Si-N), known as K center defects, are the primary charge trapping defects present in the SiNx films. A custom built corona charging tool was used to externally inject positive or negative charges in the SiNx film. Detailed Capacitance-Voltage (C-V) measurements taken on corona charged SiNx samples confirmed the presence of a net positive or negative charge density, as high as +/- 8 x 1012 cm-2, present in the SiNx film. High-energy (~ 4.9 eV) UV radiation was used to control and neutralize the charges in the SiNx films. Electron-Spin-Resonance (ESR) technique was used to detect and quantify the density of neutral K0 defects that are paramagnetically active. The density of the neutral K0 defects increased after UV treatment and decreased after high temperature annealing and charging treatments. Etch-back C-V measurements on SiNx films showed that the K centers are spread throughout the bulk of the SiNx film and not just near the SiNx-Si interface. It was also shown that the negative injected charges in the SiNx film were stable and present even after 1 year under indoor room-temperature conditions. Lastly, a stack of SiO2/SiNx dielectric layers applicable to standard commercial solar cells was developed using a low temperature (< 400 °C) PECVD process. Excellent surface passivation on FZ and CZ Si substrates for both n- and p-type samples was achieved by manipulating and controlling the charge in SiNx films.
ContributorsSharma, Vivek (Author) / Bowden, Stuart (Thesis advisor) / Schroder, Dieter (Committee member) / Honsberg, Christiana (Committee member) / Roedel, Ronald (Committee member) / Alford, Terry (Committee member) / Arizona State University (Publisher)
Created2013
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Description
Zinc telluride (ZnTe) is an attractive II-VI compound semiconductor with a direct

bandgap of 2.26 eV that is used in many applications in optoelectronic devices. Compared

to the two dimensional (2D) thin-film semiconductors, one-dimensional (1D)

nanowires can have different electronic properties for potential novel applications.

In this work, we present the study of ZnTe

Zinc telluride (ZnTe) is an attractive II-VI compound semiconductor with a direct

bandgap of 2.26 eV that is used in many applications in optoelectronic devices. Compared

to the two dimensional (2D) thin-film semiconductors, one-dimensional (1D)

nanowires can have different electronic properties for potential novel applications.

In this work, we present the study of ZnTe nanowires (NWs) that are synthesized

through a simple vapor-liquid-solid (VLS) method. By controlling the presence or

the absence of Au catalysts and controlling the growth parameters such as growth

temperature, various growth morphologies of ZnTe, such as thin films and nanowires

can be obtained. The characterization of the ZnTe nanostructures and films was

performed using scanning electron microscope (SEM), energy-dispersive X-ray spectroscopy

(EDX), high- resolution transmission electron microscope (HRTEM), X-ray

diffraction (XRD), photoluminescence (PL), Raman spectroscopy and light scattering

measurement. After confirming the crystal purity of ZnTe, two-terminal diodes and

three-terminal transistors were fabricated with both nanowire and planar nano-sheet

configurations, in order to correlate the nanostructure geometry to device performance

including field effect mobility, Schottky barrier characteristics, and turn-on

characteristics. Additionally, optoelectronic properties such as photoconductive gain

and responsivity were compared against morphology. Finally, ZnTe was explored in

conjunction with ZnO in order to form type-II band alignment in a core-shell nanostructure.

Various characterization techniques including scanning electron microscopy,

energy-dispersive X-ray spectroscopy , x-ray diffraction, Raman spectroscopy, UV-vis

reflectance spectra and photoluminescence were used to investigate the modification

of ZnO/ZnTe core/shell structure properties. In PL spectra, the eliminated PL intensity

of ZnO wires is primarily attributed to the efficient charge transfer process

occurring between ZnO and ZnTe, due to the band alignment in the core/shell structure. Moreover, the result of UV-vis reflectance spectra corresponds to the band

gap energy of ZnO and ZnTe, respectively, which confirm that the sample consists of

ZnO/ZnTe core/shell structure of good quality.
ContributorsPeng, Jhih-hong (Author) / Yu, Hongbin (Thesis advisor) / Roedel, Ronald (Committee member) / Goryll, Michael (Committee member) / Zhao, Yuji (Committee member) / Arizona State University (Publisher)
Created2017