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Description
Ge1-ySny alloys represent a new class of photonic materials for integrated optoelectronics on Si. In this work, the electrical and optical properties of Ge1-ySny alloy films grown on Si, with concentrations in the range 0 ≤ y ≤ 0.04, are studied via a variety of methods. The first microelectronic devices

Ge1-ySny alloys represent a new class of photonic materials for integrated optoelectronics on Si. In this work, the electrical and optical properties of Ge1-ySny alloy films grown on Si, with concentrations in the range 0 ≤ y ≤ 0.04, are studied via a variety of methods. The first microelectronic devices from GeSn films were fabricated using newly developed CMOS-compatible protocols, and the devices were characterized with respect to their electrical properties and optical response. The detectors were found to have a detection range that extends into the near-IR, and the detection edge is found to shift to longer wavelengths with increasing Sn content, mainly due to the compositional dependence of the direct band gap E0. With only 2 % Sn, all of the telecommunication bands are covered by a single detector. Room temperature photoluminescence was observed from GeSn films with Sn content up to 4 %. The peak wavelength of the emission was found to shift to lower energies with increasing Sn content, corresponding to the decrease in the direct band gap E0 of the material. An additional peak in the spectrum was assigned to the indirect band gap. The separation between the direct and indirect peaks was found to decrease with increasing Sn concentration, as expected. Electroluminescence was also observed from Ge/Si and Ge0.98Sn0.02 photodiodes under forward bias, and the luminescence spectra were found to match well with the observed photoluminescence spectra. A theoretical expression was developed for the luminescence due to the direct band gap and fit to the data.
ContributorsMathews, Jay (Author) / Menéndez, Jose (Thesis advisor) / Kouvetakis, John (Thesis advisor) / Drucker, Jeffery (Committee member) / Chizmeshya, Andrew (Committee member) / Ponce, Fernando (Committee member) / Arizona State University (Publisher)
Created2011
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Description
In this experiment, an attempt was made to measure the index of refraction of a thin glass microscope slide, with a known thickness of 1.01 mm. A monochromatic laser with wavelength of 532nm was employed to generate the interference pattern through the use of a Michelson interferometer. The slide was

In this experiment, an attempt was made to measure the index of refraction of a thin glass microscope slide, with a known thickness of 1.01 mm. A monochromatic laser with wavelength of 532nm was employed to generate the interference pattern through the use of a Michelson interferometer. The slide was placed in the path of one of the beams. The slide could then be rotated through a series of angles, and, from the resulting changes in the interference pattern, the index of refraction of the slide could be extracted. The index of refraction was found to be 1.5±0.02.
ContributorsSwenson, Jordan (Author) / Sukharev, Maxim (Thesis director) / Bennett, Peter (Committee member) / Barrett, The Honors College (Contributor) / Department of Physics (Contributor)
Created2014-05