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          <dc:identifier>https://hdl.handle.net/2286/R.I.45289</dc:identifier>
          <dc:identifier>&lt;p&gt;Cadiz, F., Courtade, E., Robert, C., Wang, G., Shen, Y., Cai, H., . . . Urbaszek, B. (2017). Excitonic Linewidth Approaching the Homogeneous Limit in MoS2-Based van der Waals Heterostructures. Physical Review X, 7(2). doi:10.1103/physrevx.7.021026&lt;/p&gt;
</dc:identifier>
          <dc:identifier>10.1103/PhysRevX.7.021026</dc:identifier>
          <dc:identifier>2160-3308</dc:identifier>
                  <dc:rights>http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
          <dc:rights>open access</dc:rights>
          <dc:rights>http://creativecommons.org/licenses/by/4.0</dc:rights>
                  <dc:date>2017-05-18</dc:date>
                  <dc:format>12 pages</dc:format>
                  <dc:language>eng</dc:language>
                  <dc:contributor>Cadiz, F.</dc:contributor>
          <dc:contributor>Courtade, E.</dc:contributor>
          <dc:contributor>Robert, C.</dc:contributor>
          <dc:contributor>Wang, G.</dc:contributor>
          <dc:contributor>Shen, Yuxia</dc:contributor>
          <dc:contributor>Cai, Hui</dc:contributor>
          <dc:contributor>Taniguchi, T.</dc:contributor>
          <dc:contributor>Watanabe, K.</dc:contributor>
          <dc:contributor>Carrere, H.</dc:contributor>
          <dc:contributor>Lagarde, D.</dc:contributor>
          <dc:contributor>Manca, M.</dc:contributor>
          <dc:contributor>Amand, T.</dc:contributor>
          <dc:contributor>Renucci, P.</dc:contributor>
          <dc:contributor>Tongay, Sefaattin</dc:contributor>
          <dc:contributor>Marie, X.</dc:contributor>
          <dc:contributor>Urbaszek, B.</dc:contributor>
          <dc:contributor>Ira A. Fulton School of Engineering</dc:contributor>
                  <dc:description>Published by the American Physical Society. View the article as published at https://journals.aps.org/prx/abstract/10.1103/PhysRevX.7.021026</dc:description>
          <dc:description>&lt;p&gt;The strong light-matter interaction and the valley selective optical selection rules make monolayer (ML) MoS&lt;sub&gt;2&lt;/sub&gt; an exciting 2D material for fundamental physics and optoelectronics applications. But, so far, optical transition linewidths even at low temperature are typically as large as a few tens of meV and contain homogeneous and inhomogeneous contributions. This prevented in-depth studies, in contrast to the better-characterized ML materials MoSe&lt;sub&gt;2&lt;/sub&gt; and WSe&lt;sub&gt;2&lt;/sub&gt;. In this work, we show that encapsulation of ML MoS&lt;sub&gt;2&lt;/sub&gt; in hexagonal boron nitride can efficiently suppress the inhomogeneous contribution to the exciton linewidth, as we measure in photoluminescence and reflectivity a FWHM down to 2 meV at T = 4 K. Narrow optical transition linewidths are also observed in encapsulated WS&lt;sub&gt;2&lt;/sub&gt;, WSe&lt;sub&gt;2&lt;/sub&gt;, and MoSe&lt;sub&gt;2&lt;/sub&gt; MLs. This indicates that surface protection and substrate flatness are key ingredients for obtaining stable, high-quality samples. Among the new possibilities offered by the well-defined optical transitions, we measure the homogeneous broadening induced by the interaction with phonons in temperature-dependent experiments. We uncover new information on spin and valley physics and present the rotation of valley coherence in applied magnetic fields perpendicular to the ML.&lt;/p&gt;
</dc:description>
                  <dc:type>Text</dc:type>
                  <dc:title>Excitonic Linewidth Approaching the Homogeneous Limit in MoS2-Based Van Der Waals Heterostructures</dc:title></oai_dc:dc></metadata></record></GetRecord></OAI-PMH>
