Description

Electroplating of aluminum (Al) on silicon (Si) substrates has been demonstrated in an above-room-temperature ionic liquid for the metallization of wafer-Si solar cells. The electrolyte was prepared by mixing anhydrous

Electroplating of aluminum (Al) on silicon (Si) substrates has been demonstrated in an above-room-temperature ionic liquid for the metallization of wafer-Si solar cells. The electrolyte was prepared by mixing anhydrous aluminum chloride and 1-ethyl-3-methylimidazolium tetrachloroaluminate. The plating was carried out by means of galvanostatic electrolysis. The structural and compositional properties of the Al deposits were characterized, and the sheet resistance of the deposits revealed the effects of pre-bake conditions, deposition temperature, and post-deposition annealing conditions.

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Date Created
  • 2014-11-30
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  • Text
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    Identifier
    • Digital object identifier: 10.1149/2.0021504eel
    • Identifier Type
      International standard serial number
      Identifier Value
      2162-8734

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    Sun, Wen-Cheng, Han, Xiaofei, & Tao, Meng (2015). Electroplating of Aluminium on Silicon in an Ionic Liquid. ECS ELECTROCHEMISTRY LETTERS, 4(4). http://dx.doi.org/10.1149/2.0021504eel

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