Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films

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Ferromagnetic Heusler Co[subscript 2]FeAl[subscript 0.5]Si[subscript 0.5] epitaxial thin-films have been fabricated in the L2[subscript 1] structure with saturation magnetizations over 1200 emu/cm[superscript 3]. Andreev reflection measurements show that the spin

Ferromagnetic Heusler Co[subscript 2]FeAl[subscript 0.5]Si[subscript 0.5] epitaxial thin-films have been fabricated in the L2[subscript 1] structure with saturation magnetizations over 1200 emu/cm[superscript 3]. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.