Description

Ferromagnetic Heusler Co[subscript 2]FeAl[subscript 0.5]Si[subscript 0.5] epitaxial thin-films have been fabricated in the L2[subscript 1] structure with saturation magnetizations over 1200 emu/cm[superscript 3]. Andreev reflection measurements show that the spin

Ferromagnetic Heusler Co[subscript 2]FeAl[subscript 0.5]Si[subscript 0.5] epitaxial thin-films have been fabricated in the L2[subscript 1] structure with saturation magnetizations over 1200 emu/cm[superscript 3]. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

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    Date Created
    • 2014-04-15
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    Identifier
    • Digital object identifier: 10.1063/1.4869798
    • Identifier Type
      International standard serial number
      Identifier Value
      2166-532X
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    Vahidi, M., Gifford, J. A., Zhang, S. K., Krishnamurthy, S., Yu, Z. G., Yu, L., . . . Newman, N. (2014). Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films. APL Materials, 2(4), 046108. doi:10.1063/1.4869798

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