High Quality Transparent TiO2/Ag/TiO2 Composite Electrode Films Deposited on Flexible Substrate at Room Temperature by Sputtering

Multilayer structures of TiO₂/Ag/TiO₂ have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (t_c) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for t_c has one of the highest FOMs with 61.4 × 10^-3 Ω^-1/sq.