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Multilayer structures of TiO[subscript 2]/Ag/TiO[subscript 2] have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and

Multilayer structures of TiO[subscript 2]/Ag/TiO[subscript 2] have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (t[subscript c]) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm.

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    Date Created
    • 2013-06-07
    Resource Type
  • Text
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    Identifier
    • Digital object identifier: 10.1063/1.4808438
    • Identifier Type
      International standard serial number
      Identifier Value
      2166-532X
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    Dhar, A., & Alford, T. L. (2013). High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering. APL Materials, 1(1), 012102. doi:10.1063/1.4808438

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