Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10-3 Ω-1/sq.
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- High Quality Transparent TiO2/Ag/TiO2 Composite Electrode Films Deposited on Flexible Substrate at Room Temperature by Sputtering
- Dhar, Aritra (Author)
- Alford, Terry (Author)
- Department of Chemistry and Biochemistry (Contributor)
- Digital object identifier: 10.1063/1.4808438
- Identifier TypeInternational standard serial numberIdentifier Value2166-532X
- The final version of this article, as published in APL Materials, can be viewed online at: http://aip.scitation.org/doi/10.1063/1.4808438, opens in a new window
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Dhar, A., & Alford, T. L. (2013). High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering. APL Materials, 1(1), 012102. doi:10.1063/1.4808438